Dual-Chamber Optical Coating System

High-throughput magnetron sputtering system designed for precision optical thin films, including AR, HR and multilayer coatings.

Overview

Dual-chamber configuration improves coating efficiency, film uniformity and production stability. Designed for optical coating applications with flexible target configuration.

AR CoatingsHR CoatingsOptical FiltersMultilayer Films

Key Features

Dual-Chamber Design

Enables continuous coating with improved throughput and stable process conditions.

Flexible Configuration

Multiple target arrangements for complex multilayer film stacks.

High Uniformity

Optimized coating performance for precision optical applications.

Applications

Optical LensesCamera LensesUV/IR Cut FiltersPrecision FiltersDisplay ComponentsAutomotive Display PanelsAR CoatingsHR CoatingsColor Films

Technical Specifications

Vacuum Chamber SizeΦ1800 × 2100 mm, customizable

Workpiece Fixture SizeΦ1600 × 1400 mm (H)

Fixture Rotation Speed50–100 rpm

Coating AreaApprox. 7 m²

Sputtering Source4 pairs / 8 targets + ICP

Ion SourceAnode layer ion source / PLASMA

High Vacuum Pumping System6 TMP + 2 TMP (DP)

Rough Vacuum Pumping System630 mechanical pump + 1200 roots pump

Ultimate Vacuum≤ 1.0 × 10⁻⁴ Pa

Pump-down TimeApprox. 10 min from atmosphere to 3.0 × 10⁻³ Pa

Temperature Control0–300 °C

Need a customized coating solution?

System configuration, chamber size, target arrangement, pumping system and process modules can be adapted according to substrate geometry, film stack and production requirements.