Industrial Protective Coating System

Magnetron sputtering system for hard protective coatings, wear-resistant films and industrial surface treatment applications.

Overview

This system uses the same machine body platform as the concave magnetron sputtering system, but is configured for industrial protective coatings. It is equipped with DC substrate bias for improved film adhesion and coating performance, while film thickness is controlled by process time instead of QCM monitoring.

Hard CoatingsWear ProtectionLow-Friction FilmsIndustrial Surface Treatment

Key Features

DC Substrate Bias

Substrate bias can improve film adhesion, density and coating performance for industrial protective applications.

Time-Based Thickness Control

Film thickness is controlled by process time, suitable for stable industrial coating recipes.

Protective Coating Configuration

Configured for hard, wear-resistant and functional industrial coating processes.

Applications

Hard Protective CoatingsWear-Resistant CoatingsLow-Friction CoatingsMetal Surface TreatmentIndustrial Components

Technical Specifications

Vacuum Chamber SizeΦ1600 × 2100 mm, customizable

Workpiece Fixture SizeΦ1400 × 1650 mm

Fixture Rotation Speed0–50 rpm

Film Thickness ControlTime-based control

Substrate BiasDC bias

Sputtering Source4 pairs / 8 targets

Ion SourceLinear ion source

High Vacuum Pumping SystemRoots pump group + 3 TMP

Rough Vacuum Pumping System630 mechanical pump + 1200 roots pump

Ultimate Vacuum≤ 3.0 × 10⁻⁴ Pa

Pump-down TimeApprox. 15 min from atmosphere to 3.0 × 10⁻³ Pa

Temperature Control0–300 °C

Need a customized coating solution?

System configuration, chamber size, target arrangement, pumping system and process modules can be adapted according to substrate geometry, film stack and production requirements.