Magnetron Sputtering System

Flexible magnetron sputtering system for consumer electronics, display components, functional films and decorative surface coatings.

Overview

This system supports ion cleaning, high-vacuum pumping, metal sputtering, oxide coating and optional AF coating processes. It is suitable for functional and decorative coating applications requiring multiple coating steps.

Functional FilmsDisplay ComponentsMetal CoatingsAF Coatings

Key Features

Multi-Process Capability

Supports ion cleaning, metal sputtering, oxide coating and optional AF surface treatment.

Multi-Target Configuration

Equipped with multiple coating positions for flexible film stack design.

Functional Surface Coating

Suitable for HUD, automotive mirrors, display panels and functional consumer electronics parts.

Applications

HUD ComponentsFunctional Automotive MirrorsDisplay PanelsConsumer Electronics PartsAF Surface Treatment

Technical Specifications

Vacuum Chamber SizeΦ1600 × 2100 mm, customizable

Workpiece Fixture SizeΦ1400 × 1650 mm

Fixture Rotation Speed0–50 rpm

Film Thickness ControlMetal coating + AR coating + AF coating

Sputtering Source10 coating positions

Ion SourceAnode layer ion source / PLASMA

High Vacuum Pumping System3 TMP

Rough Vacuum Pumping System630 mechanical pump + 1200 roots pump

Ultimate Vacuum≤ 3.0 × 10⁻⁴ Pa

Pump-down TimeApprox. 10 min from atmosphere to 3.0 × 10⁻³ Pa

Temperature Control0–300 °C

Need a customized coating solution?

System configuration, chamber size, target arrangement, pumping system and process modules can be adapted according to substrate geometry, film stack and production requirements.