Concave Magnetron Sputtering System

Specialized magnetron sputtering system for inner-surface coating, curved substrates and decorative optical films.

Overview

This system uses a central target layout with products rotating around the sputtering source. It is designed for concave or curved parts, helping improve coating uniformity and reduce film stress.

Concave CoatingColor FilmsInner Surface CoatingCurved Substrates

Key Features

Concave Geometry Design

Optimized for coating inner surfaces and curved product geometries.

Improved Uniformity

Suitable for products with curved surfaces where standard coating layouts may be less effective.

Stress Reduction

Designed for thick films and decorative optical coatings with reduced film stress.

Applications

Mobile Back CoversDecorative Optical FilmsAR CoatingsConsumer Electronics Parts

Technical Specifications

Vacuum Chamber SizeΦ1600 × 2100 mm, customizable

Workpiece Fixture SizeΦ1400 × 1650 mm

Fixture Rotation Speed0–50 rpm

Film Thickness ControlQCM

Sputtering Source4 pairs / 8 targets, inner coating

Ion SourceLinear ion source

High Vacuum Pumping SystemRoots pump group + 3 TMP

Rough Vacuum Pumping System630 mechanical pump + 1200 roots pump

Ultimate Vacuum≤ 3.0 × 10⁻⁴ Pa

Pump-down TimeApprox. 15 min from atmosphere to 3.0 × 10⁻³ Pa

Temperature Control0–300 °C

Need a customized coating solution?

System configuration, chamber size, target arrangement, pumping system and process modules can be adapted according to substrate geometry, film stack and production requirements.